French Illustrator Marc-Antoine Coulon debuts ‘Unapologetic Lines’ at SCADFASH Museum
Savannah College of Art and Design (SCAD) debuts “Unapologetic Lines,” the first U.S. solo exhibition of acclaimed Parisian fashion illustrator Marc-Antoine Coulon at the SCAD FASH Museum of Fashion + Film in Atlanta. The compendious body of work on view draws from Coulon’s specially commissioned illustrations over his career for Vogue, Madame Figaro, Elle, L’Officiel de la Mode, Town & Country, InStyle and more.
“Unapologetic Lines” also includes captivating portraits of fashion icons and the many designers and celebrities Coulon has encountered. Coulon has taken significant part in the recent renaissance of fashion illustration and elevates the renewal of the medium with his glamorous, elegant, timeless and irreverent style.
This is the first fashion illustration mounted by the SCADFASH Museum and is curated by SCAD director of fashion exhibitions, Rafael Gomes. Prior to joining SCAD, Gomes was an archivist and exhibition coordinator at Vivienne Westwood and designed, planned and executed large-scale exhibitions at numerous world-renowned museums and galleries, including the Victoria and Albert Museum, the Palace of Versailles, the Metropolitan Museum of Art and the SCAD Museum of Art.
“Unapologetic Lines” follows the recent “Pierre Carden: Pursuit of the Future,” a major retrospective of the legendary design, and the premiere U.S. solo exhibition of “Guo Pei: Couture Beyond,” one of SCAD’s traveling exhibitions that garnered international attention and will debut in Canada at the Vancouver Art Gallery in collaboration with SCAD FASH Museum of Fashion + Film (October 13, 2018 — January 20, 2019).
SCAD is a global university and the only art and design university with three museums; the SCAD Museum of Art in Savannah, SCAD FASH Museum of Fashion + Film in Atlanta and the Lacoste Admission and History Center in France.
“Unapologetic Lines,” on view Sept. 14–Jan. 27
SCAD FASH Museum of Fashion + Film, 1600 Peachtree St. NW, Atlanta
